![Structure evolution and ferroelectric and dielectric properties of Bi[sub 3.5]Nd[sub 0.5]Ti[sub 3]O[sub 12] thin films under a moderate temperature annealing]()
Structure evolution and ferroelectric and dielectric properties of Bi[sub 3.5]Nd[sub 0.5]Ti[sub 3]O[sub 12] thin films under a moderate temperature annealingZhong, X. L.; Wang, J. B.; Zheng, X. J.; Zhou, Y. C.; Yang, G. W. · Applied Physics Letters · 2004