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SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Auxiliary pattern for cell-based OPC

SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Auxiliary pattern for cell-based OPC

Kahng, Andrew B.; Martin, Patrick M.; Naber, Robert J.; Park, Chul-Hong
  • 作者Kahng, Andrew B.; Martin, Patrick M.; Naber, Robert J.; Park, Chul-Hong
  • 卷第6349卷
  • 印刷ISSN0277-786X
  • 文件大小338.85KB
  • 发表时间2006
  • DOI10.1117/12.692582
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