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Advances in pulsed-laser-deposited AIN thin films for high-temperature capping, device passivation, and piezoelectric-based RF MEMS/NEMS resonator applications

Advances in pulsed-laser-deposited AIN thin films for high-temperature capping, device passivation, and piezoelectric-based RF MEMS/NEMS resonator applications

S. S. Hullavarad; R. D. Vispute; B. Nagaraj; V. N. Kulkarni; S. Dhar; T. Venkatesan; K. A. Jones; M. Derenge; T. Zheleva; M. H. Ervin; A. Lelis; C. J. Scozzie; D. Habersat; A. E. Wickenden; L. J. Currano; M. Dubey
  • 作者S. S. Hullavarad; R. D. Vispute; B. Nagaraj; V. N. Kulkarni; S. Dhar; T. Venkatesan; K. A. Jones; M. Derenge; T. Zheleva; M. H. Ervin; A. Lelis; C. J. Scozzie; D. Habersat; A. E. Wickenden; L. J. Currano; M. Dubey
  • 卷第35卷
  • 期第4期
  • 印刷ISSN0361-5235
  • 电子ISSN1543-186X
  • 文件大小643.47KB
  • 发表时间2006
  • DOI10.1007/s11664-006-0138-5
  • 页码777-794
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