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Polymer Viscoelasticity and Residual Stress Effects on Nanoimprint Lithography

Polymer Viscoelasticity and Residual Stress Effects on Nanoimprint Lithography

Y. Ding; H. W. Ro; J. F. Douglas; R. L. Jones; D. R. Hine; A. Karim; C. L. Soles
  • 作者Y. Ding; H. W. Ro; J. F. Douglas; R. L. Jones; D. R. Hine; A. Karim; C. L. Soles
  • 卷第19卷
  • 期第10期
  • 印刷ISSN0935-9648
  • 电子ISSN1521-4095
  • 文件大小142.14KB
  • 发表时间2007
  • DOI10.1002/adma.200601998
  • 页码1377-1382
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