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Mass spectrometer analysis of plasma containing easily dissociated species: Absolute concentrations of the main free radicals Si(CH3)1,2,3, and H2Si(CH3) produced in a microwave discharge sustained in an Ar–Si(CH3)4 gas mixture

Mass spectrometer analysis of plasma containing easily dissociated species: Absolute concentrations of the main free radicals Si(CH3)1,2,3, and H2Si(CH3) produced in a microwave discharge sustained in an Ar–Si(CH3)4 gas mixture

J.L. Jauberteau; I. Jauberteau; J. Aubreton
  • 作者J.L. Jauberteau; I. Jauberteau; J. Aubreton
  • 卷第266卷
  • 印刷ISSN1387-3806
  • 文件大小983.85KB
  • 发表时间2007
  • DOI10.1016/j.ijms.2007.06.009
  • 页码15-24
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