[IEEE 2007 15th International Conference on Advanced Thermal Processing of Semiconductors - Cannizzaro, Catania, Italy (2007.10.2-2007.10.5)] 2007 15th International Conference on Advanced Thermal Processing of Semiconductors - Atomistic Modeling of Carbon Co-Implants and Rapid Thermal Anneals in Silicon
Zographos, Nikolas; Martin-Bragado, Ignacio
- 作者Zographos, Nikolas; Martin-Bragado, Ignacio
- 文件大小1076.03KB
- 发表时间2007
- DOI10.1109/rtp.2007.4383829
- 页码119-122