Measurement and modeling of Ar∕H[sub 2]∕CH[sub 4] arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C[sub 2], and CH radical densities

Rennick, C. J.; Ma, J.; Henney, J. J.; Wills, J. B.; Ashfold, M. N. R.; Orr-Ewing, A. J.; Mankelevich, Yu. A.

期刊名称Journal of Applied Physics
作者Rennick, C. J.; Ma, J.; Henney, J. J.; Wills, J. B.; Ashfold, M. N. R.; Orr-Ewing, A. J.; Mankelevich, Yu. A.
卷第102卷
期第6期
印刷ISSN0021-8979
文件大小549.51KB
发表时间2007
DOI10.1063/1.2783890

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