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Enhanced Critical Current under a Magnetic Field in Sm
<sub/>
1+
<i>x</i>
</sub>
B
<sub/>
2-
<i>x</i>
</sub>
Cu
<sub/>3</sub>
O
<sub/><i>y</i>
</sub>
Thick Films Prepared Using Low-temperature Growth Technique

Enhanced Critical Current under a Magnetic Field in Sm _{1+
x} B _{2-
x} Cu ₃ O _y Thick Films Prepared Using Low-temperature Growth Technique

Miura, Masashi; Yoshida, Yutaka; Ozaki, Toshinori; Ichino, Yusuke; Takai, Yoshiaki; Matsumoto, Kaname; Ichinose, Ataru; Horii, Shigeru; Mukaida, Masashi

期刊名称Japanese Journal of Applied Physics
作者Miura, Masashi; Yoshida, Yutaka; Ozaki, Toshinori; Ichino, Yusuke; Takai, Yoshiaki; Matsumoto, Kaname; Ichinose, Ataru; Horii, Shigeru; Mukaida, Masashi
卷第46卷
印刷ISSN0021-4922
文件大小255.95KB
发表时间2007-8-24
DOI10.1143/jjap.46.l807

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