Influence of substrate orientation on low-temperature epitaxial growth of ferromagnetic silicide Fe3Si on Si
- 作者Koji Ueda; Ryo Kizuka; Hisashi Takeuchi; Atsushi Kenjo; Taizoh Sadoh; Masanobu Miyao
- 卷第515卷
- 期第22期
- 印刷ISSN0040-6090
- 文件大小1203.36KB
- 发表时间2007
- DOI10.1016/j.tsf.2007.02.052
- 页码8250-8253