发现好书期刊,享受阅读乐趣

海量图书期刊资源,随时随地畅享阅读乐趣

Advances in Understanding and Control of CMP Performance: Contact-Hydrodynamics at Wafer, Groove, and Asperity Scale

Advances in Understanding and Control of CMP Performance: Contact-Hydrodynamics at Wafer, Groove, and Asperity Scale

Muldowney, Gregory P.
  • 期刊名称MRS Proceedings
  • 作者Muldowney, Gregory P.
  • 卷第991卷
  • 电子ISSN1946-4274
  • 文件大小4351.28KB
  • 发表时间2007-1
  • DOI10.1557/PROC-0991-C06-01
← 返回【学霸图书馆】主页