[ECS 212th ECS Meeting - Washington, DC (October 7 - October 12, 2007)] ECS Transactions - Achievement of Higher-k and High-Φ in Phase Controlled HfO2 Film Using Post Gate Electrode Deposition Annealing
Watanabe, Yukimune; Ota, Hiroyuki; Migita, Shinji; Kamimuta, Yuuichi; Iwamoto, Kunihiko; Takahashi, Masashi; Ogawa, Arito; Ito, Hiromi; Nabatame, Toshihide; Toriumi, Akira
- 作者Watanabe, Yukimune; Ota, Hiroyuki; Migita, Shinji; Kamimuta, Yuuichi; Iwamoto, Kunihiko; Takahashi, Masashi; Ogawa, Arito; Ito, Hiromi; Nabatame, Toshihide; Toriumi, Akira
- 卷第11卷
- 文件大小699.88KB
- 发表时间2007
- DOI10.1149/1.2779546
- 页码35-45