Liquid Injection Atomic Layer Deposition of TiO[sub x] Films Using Ti[OCH(CH[sub 3])[sub 2]][sub 4]
Watanabe, Takayuki; Hoffmann-Eifert, Susanne; Yang, Lin; Rüdiger, Andreas; Kügeler, Carsten; Hwang, Cheol Seong; Waser, Rainer
- 期刊名称Journal of The Electrochemical Society
- 作者Watanabe, Takayuki; Hoffmann-Eifert, Susanne; Yang, Lin; Rüdiger, Andreas; Kügeler, Carsten; Hwang, Cheol Seong; Waser, Rainer
- 卷第154卷
- 期第6期
- 印刷ISSN0013-4651
- 文件大小374.27KB
- 发表时间2007
- DOI10.1149/1.2724126