Effective surface treatments for selective epitaxial SiGe growth in locally strained pMOSFETs

P. L. Cheng; C. I. Liao; H. R. Wu; Y. C. Chen; C. C. Chien; C. L. Yang; S. F. Tzou; J. Tang; R. Kodali; L. Washington; Y. Cho; V. C. Chang; T. Fu; W. S. Hsu

作者P. L. Cheng; C. I. Liao; H. R. Wu; Y. C. Chen; C. C. Chien; C. L. Yang; S. F. Tzou; J. Tang; R. Kodali; L. Washington; Y. Cho; V. C. Chang; T. Fu; W. S. Hsu
文件大小814.31KB
发表时间2007
DOI10.1088/0268-1242/22/1/S33

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Effective surface treatments for selective epitaxial SiGe growth in locally strained pMOSFETs