SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Phenolic molecular glasses as resists for next-generation lithography
André, Xavier; Lee, Jin Kyun; De Silva, Anuja; Felix, Nelson; Ober, Christopher K.; Cao, Heidi B.; Deng, Hai; Kudo, Hiroto; Watanabe, Daisuke; Nishikubo, Tadatomi; Lin, Qinghuang
- 作者André, Xavier; Lee, Jin Kyun; De Silva, Anuja; Felix, Nelson; Ober, Christopher K.; Cao, Heidi B.; Deng, Hai; Kudo, Hiroto; Watanabe, Daisuke; Nishikubo, Tadatomi; Lin, Qinghuang
- 卷第6519卷
- 印刷ISSN0277-786X
- 文件大小292.06KB
- 发表时间2007
- DOI10.1117/12.722919