SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Teracomputing for mask data preparation

• 作者Nogatch, John; Naber, Robert J.; Kawahira, Hiroichi; Kirsch, Hartmut; Mostafa, Kamal; Newell, Glenn; Yeap, Johnny
• 卷第6730卷
• 印刷ISSN0277-786X
• 文件大小567.83KB
• 发表时间2007
• DOI10.1117/12.746776