SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Layout and EB data reduction: comparison of OASIS based approach with format-specific reversible compressions
Pai, Ravi; Watanabe, Hidehiro; Pereira, Mark; Manu, C. S.; Parchuri, Anil; Baruah, Barsha
- 作者Pai, Ravi; Watanabe, Hidehiro; Pereira, Mark; Manu, C. S.; Parchuri, Anil; Baruah, Barsha
- 卷第6607卷
- 印刷ISSN0277-786X
- 文件大小276.98KB
- 发表时间2007
- DOI10.1117/12.728947