Feasibility to Measure Sidewall Structures of Electronic Device Pattern Using the Inclination AFM

• 期刊名称Journal of the Japan Institute of Metals
• 作者Terauchi, Daisuke; Hoshino, Kenichi; Okada, Daisuke; Sone, Hayato; Hosaka, Sumio
• 卷第71卷
• 期第5期
• 印刷ISSN0021-4876
• 电子ISSN1880-6880
• 文件大小1047.68KB
• 发表时间2007
• DOI10.2320/jinstmet.71.463
• 页码463-468