Rapid crystallization of amorphous silicon utilizing a VHF plasma annealing at atmospheric pressure
- 期刊名称The European Physical Journal Applied Physics
- 作者Shirai, H.; Sakurai, Y.; Yeo, M.; Kobayashi, T.; Ishikawa, T.
- 卷第37卷
- 期第3期
- 印刷ISSN1286-0042
- 电子ISSN1286-0050
- 文件大小2068.74KB
- 发表时间2007-03
- DOI10.1051/epjap:2007025
- 页码315-322
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