Cyclophosphazene-containing Polymers as Imprint Lithography Resists
- 作者Erik C. Hagberg; Mark W. Hart; Lianhui Cong; Christopher W. Allen; Kenneth R. Carter
- 卷第17卷
- 期第2期
- 印刷ISSN1574-1443
- 电子ISSN1574-1451
- 文件大小334.28KB
- 发表时间2007-06
- DOI10.1007/s10904-007-9130-7
- 页码377-385
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