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Dependences of structural and electrical properties on thickness of polycrystalline Ga-doped ZnO thin films prepared by reactive plasma deposition

Dependences of structural and electrical properties on thickness of polycrystalline Ga-doped ZnO thin films prepared by reactive plasma deposition

T. Yamada; T. Nebiki; S. Kishimoto; H. Makino; K. Awai; T. Narusawa; T. Yamamoto

作者T. Yamada; T. Nebiki; S. Kishimoto; H. Makino; K. Awai; T. Narusawa; T. Yamamoto
卷第42卷
印刷ISSN0749-6036
电子ISSN1096-3677
文件大小379.09KB
发表时间2007
DOI10.1016/j.spmi.2007.04.080
页码68-73

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