Influence of H[sub 2]O and O[sub 2] on threshold voltage shift in organic thin-film transistors: Deprotonation of SiOH on SiO[sub 2] gate-insulator surface
Kumaki, Daisuke; Umeda, Tokiyoshi; Tokito, Shizuo
- 期刊名称Applied Physics Letters
- 作者Kumaki, Daisuke; Umeda, Tokiyoshi; Tokito, Shizuo
- 卷第92卷
- 期第9期
- 印刷ISSN0003-6951
- 文件大小687.23KB
- 发表时间2008
- DOI10.1063/1.2890853