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Influence of H[sub 2]O and O[sub 2] on threshold voltage shift in organic thin-film transistors: Deprotonation of SiOH on SiO[sub 2] gate-insulator surface

Influence of H[sub 2]O and O[sub 2] on threshold voltage shift in organic thin-film transistors: Deprotonation of SiOH on SiO[sub 2] gate-insulator surface

Kumaki, Daisuke; Umeda, Tokiyoshi; Tokito, Shizuo
  • 期刊名称Applied Physics Letters
  • 作者Kumaki, Daisuke; Umeda, Tokiyoshi; Tokito, Shizuo
  • 卷第92卷
  • 期第9期
  • 印刷ISSN0003-6951
  • 文件大小687.23KB
  • 发表时间2008
  • DOI10.1063/1.2890853
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