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Nanoscale perpendicular magnetic island arrays fabricated by extreme ultraviolet interference lithography

Nanoscale perpendicular magnetic island arrays fabricated by extreme ultraviolet interference lithography

F. Luo; L. J. Heyderman; H. H. Solak; T. Thomson; M. E. Best

作者F. Luo; L. J. Heyderman; H. H. Solak; T. Thomson; M. E. Best
文件大小612.43KB
发表时间2008
DOI10.1063/1.2841821

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