A low temperature fabrication of HfO[sub 2] films with supercritical CO[sub 2] fluid treatment
Tsai, Chih-Tsung; Chang, Ting-Chang; Kin, Kon-Tsu; Liu, Po-Tsun; Yang, Po-Yu; Weng, Chi-Feng; Huang, Fon-Shan
- 期刊名称Journal of Applied Physics
- 作者Tsai, Chih-Tsung; Chang, Ting-Chang; Kin, Kon-Tsu; Liu, Po-Tsun; Yang, Po-Yu; Weng, Chi-Feng; Huang, Fon-Shan
- 卷第103卷
- 期第7期
- 印刷ISSN0021-8979
- 文件大小912.71KB
- 发表时间2008
- DOI10.1063/1.2844496