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Silane injection in a high-density low-pressure plasma system and its influence on the deposition kinetics and material properties of SiO[sub 2]

Silane injection in a high-density low-pressure plasma system and its influence on the deposition kinetics and material properties of SiO[sub 2]

R. Botha; B. Haj Ibrahim; P. Bulkin; B. Drévillon
  • 作者R. Botha; B. Haj Ibrahim; P. Bulkin; B. Drévillon
  • 文件大小460.93KB
  • 发表时间2008
  • DOI10.1116/1.2949234
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