Ultrashallow junctions formed by C coimplantation with spike plus submelt laser annealing
- 作者S. B. Felch; E. Collart; V. Parihar; S. Thirupapuliyur; R. Schreutelkamp; B. J. Pawlak; T. Hoffmann; S. Severi; P. Eyben; W. Vandervorst; T. Noda
- 文件大小833.68KB
- 发表时间2008
- DOI10.1116/1.2831490
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