Properties of Nanocrystalline Cubic Silicon Carbide Thin Films Prepared by Hot-Wire Chemical Vapor Deposition Using SiH 4 /CH 4 /H 2 at Various Substrate Temperatures
- 期刊名称Japanese Journal of Applied Physics
- 作者Tabata, Akimori; Komura, Yusuke; Hoshide, Yoshiki; Narita, Tomoki; Kondo, Akihiro
- 卷第47卷
- 期第1期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小1155.72KB
- 发表时间2008-1-22
- DOI10.1143/JJAP.47.561
- 页码561-565
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