Damage formation in Ge during Ar+ implantation at 15 K
- 作者M. Hayes; A. Schroeter; E. Wendler; W. Wesch; F. D. Auret; J. M. Nel
- 卷第5卷
- 期第2期
- 印刷ISSN1610-1634
- 电子ISSN1610-1642
- 文件大小316.91KB
- 发表时间2008
- DOI10.1002/pssc.200776811
- 页码583-586
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