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Low Temperature Formation of SiO2 Thin Films by Nitric Acid Oxidation of Si and Electrical Characterization of the Film

Low Temperature Formation of SiO2 Thin Films by Nitric Acid Oxidation of Si and Electrical Characterization of the Film

MATSUMOTO, Taketoshi; IMAMURA, Kentaro; KOBAYASHI, Hikaru
  • 期刊名称Hyomen Kagaku
  • 作者MATSUMOTO, Taketoshi; IMAMURA, Kentaro; KOBAYASHI, Hikaru
  • 卷第29卷
  • 期第8期
  • 印刷ISSN0388-5321
  • 电子ISSN1881-4743
  • 文件大小390.81KB
  • 发表时间2008
  • DOI10.1380/jsssj.29.498
  • 页码498-502
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