Structure and electrical properties of HfO2high-kfilms prepared by pulsed laser deposition on Si (100)

Hao Wang; Y. Wang; J. Feng; C. Ye; B. Y. Wang; H. B. Wang; Q. Li; Y. Jiang; A. P. Huang; Z. S. Xiao

作者Hao Wang; Y. Wang; J. Feng; C. Ye; B. Y. Wang; H. B. Wang; Q. Li; Y. Jiang; A. P. Huang; Z. S. Xiao
卷第93卷
期第3期
印刷ISSN0947-8396
电子ISSN1432-0630
文件大小413.00KB
发表时间2008-11
DOI10.1007/s00339-008-4695-8
页码681-684

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