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Measuring stresses in thin metal films by means of Raman microscopy using silicon as a strain gage material

Measuring stresses in thin metal films by means of Raman microscopy using silicon as a strain gage material

Thomas Wermelinger; Christophe Charpentier; Müge Deniz Yüksek; Ralph Spolenak
  • 作者Thomas Wermelinger; Christophe Charpentier; Müge Deniz Yüksek; Ralph Spolenak
  • 卷第40卷
  • 期第12期
  • 印刷ISSN0377-0486
  • 电子ISSN1097-4555
  • 文件大小532.69KB
  • 发表时间2009
  • DOI10.1002/jrs.2332
  • 页码1849-1857
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