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Gas-Phase Kinetics of Chlorosilylene Reactions. I. ClSiH + Me
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SiH: Absolute Rate Measurements and Theoretical Calculations for Prototype Si−H Insertion Reactions

Gas-Phase Kinetics of Chlorosilylene Reactions. I. ClSiH + Me ₃ SiH: Absolute Rate Measurements and Theoretical Calculations for Prototype Si−H Insertion Reactions

Becerra, Rosa; Boganov, Sergey E.; Egorov, Mikhail P.; Faustov, Valery I.; Krylova, Irina V.; Nefedov, Oleg M.; Promyslov, Vladimir M.; Walsh, Robin

期刊名称The Journal of Physical Chemistry A
作者Becerra, Rosa; Boganov, Sergey E.; Egorov, Mikhail P.; Faustov, Valery I.; Krylova, Irina V.; Nefedov, Oleg M.; Promyslov, Vladimir M.; Walsh, Robin
卷第113卷
期第19期
印刷ISSN1089-5639
电子ISSN1520-5215
文件大小237.31KB
发表时间2009-05-14
DOI10.1021/jp901446t
页码5512-5518

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