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Si and SiGe faceting during selective epitaxy

Si and SiGe faceting during selective epitaxy

Clément Pribat; Germain Servanton; Linda Depoyan; Didier Dutartre

作者Clément Pribat; Germain Servanton; Linda Depoyan; Didier Dutartre
卷第53卷
期第8期
印刷ISSN0038-1101
文件大小432.51KB
发表时间2009
DOI10.1016/j.sse.2009.04.038
页码865-868

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