Investigations on a nitriding process of molybdenum thin films exposed to (Ar–N2–H2) expanding microwave plasma
- 作者I. Jauberteau; J.L. Jauberteau; P. Goudeau; B. Soulestin; M. Marteau; M. Cahoreau; J. Aubreton
- 卷第203卷
- 期第9期
- 印刷ISSN0257-8972
- 文件大小967.86KB
- 发表时间2009
- DOI10.1016/j.surfcoat.2008.10.012
- 页码1127-1132
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