Importance of H2 gas for growth of hot-wire CVD nanocrystalline 3C-SiC from SiH4/CH4/H2

• 作者Yoshiki Hoshide; Yusuke Komura; Akimori Tabata; Akihiko Kitagawa; Akihiro Kondo
• 卷第517卷
• 期第12期
• 印刷ISSN0040-6090
• 文件大小733.61KB
• 发表时间2009
• DOI10.1016/j.tsf.2009.01.046
• 页码3520-3523