Investigation of Deep Interface Traps in Very-Thin Oxide/Si Structures Prepared at Low Temperatures Using Chemical Solutions
- 期刊名称Materials Science Forum
- 作者Rusnák, Jaroslav; Ružinský, Michal; Imamura, Kentaro; Matsumoto, Taketoshi; Štefečka, Miloslav; Takahashi, Masao; Kobayashi, Hikaru; Pinčík, Emil
- 卷第609卷
- 电子ISSN1662-9752
- 文件大小485.22KB
- 发表时间2009
- DOI10.4028/www.scientific.net/msf.609.123
- 页码123-127
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