[AIP FRONTIERS IN PHYSICS: 3rd International Meeting - Kuala Lumpur (Malaysia) (12–16 January 2009)] AIP Conference Proceedings - Influence of Hydrogen Plasma Treatment Time to Si:H Layer Deposition Time Ratio on the Properties of Layer-by-Layer Deposited Hydrogenated Silicon (Si:H) Thin Films
Tong, Goh Boon; Ab. Gani, Siti Meriam; Muhamad, Muhamad Rasat; Rahman, Saadah Abdul; Chia, Swee-Ping; Ratnavelu, Kurunathan; Muhamad, Muhamad Rasat
- 作者Tong, Goh Boon; Ab. Gani, Siti Meriam; Muhamad, Muhamad Rasat; Rahman, Saadah Abdul; Chia, Swee-Ping; Ratnavelu, Kurunathan; Muhamad, Muhamad Rasat
- 文件大小269.76KB
- 发表时间2009
- DOI10.1063/1.3192250
- 页码262-265