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An optical parametric oscillator as a high-flux source of two-mode light for quantum lithography

An optical parametric oscillator as a high-flux source of two-mode light for quantum lithography

H. Cable; R. Vyas; S. Singh; J. P. Dowling
  • 作者H. Cable; R. Vyas; S. Singh; J. P. Dowling
  • 文件大小668.60KB
  • 发表时间2009
  • DOI10.1088/1367-2630/11/11/113055
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