SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Optical Microlithography XXII - Innovative pattern matching method considering process margin and scanner design information
Tsujita, Koichiro; Mikami, Koji; Ishii, Hiroyuki; Nakayama, Ryo; Arakawa, Mikio; Ueno, Takehiro; Fujie, Shogo; Takahashi, Kazuhiro; Levinson, Harry J.; Dusa, Mircea V.
- 作者Tsujita, Koichiro; Mikami, Koji; Ishii, Hiroyuki; Nakayama, Ryo; Arakawa, Mikio; Ueno, Takehiro; Fujie, Shogo; Takahashi, Kazuhiro; Levinson, Harry J.; Dusa, Mircea V.
- 卷第7274卷
- 印刷ISSN0277-786X
- 文件大小1089.69KB
- 发表时间2009
- DOI10.1117/12.813489