Taming the Silylium Ion for Low-Temperature Diels–Alder Reactions
- 作者Hendrik F. T. Klare; Klaus Bergander; Martin Oestreich
- 卷第48卷
- 期第48期
- 印刷ISSN1433-7851
- 电子ISSN1521-3773
- 文件大小364.81KB
- 发表时间2009
- DOI10.1002/anie.200904520
- 页码9077-9079
Masakatsu Shibasaki2009
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