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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Novel resist for replica preparation of mold for imprint lithography

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Novel resist for replica preparation of mold for imprint lithography

Matsukawa, Daisaku; Henderson, Clifford L.; Wakayama, Hiroyuki; Mitsukura, Kazuyuki; Okamura, Haruyuki; Hirai, Yoshihiko; Shirai, Masamitsu
  • 作者Matsukawa, Daisaku; Henderson, Clifford L.; Wakayama, Hiroyuki; Mitsukura, Kazuyuki; Okamura, Haruyuki; Hirai, Yoshihiko; Shirai, Masamitsu
  • 卷第7273卷
  • 印刷ISSN0277-786X
  • 文件大小443.47KB
  • 发表时间2009
  • DOI10.1117/12.813383
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