Stress engineering of the alkoxide derived ferroelectric thin film on Si wafer
- 期刊名称Journal of the Ceramic Society of Japan
- 作者OHNO, Tomoya; MALIČ, Babara; FUKAZAWA, Hiroaki; WAKIYA, Naoki; SUZUKI, Hisao; MATSUDA, Takeshi; KOSEC, Marija
- 卷第117卷
- 期第1370期
- 印刷ISSN1882-0743
- 电子ISSN1348-6535
- 文件大小728.33KB
- 发表时间2009
- DOI10.2109/jcersj2.117.1089
- 页码1089-1094
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PrefaceJournal of the Ceramic Society of Japan · 2014
PrefaceJournal of the Ceramic Society of Japan · 2014
ContentsJournal of the Ceramic Society of Japan · 2015
ContentsJournal of the Ceramic Society of Japan · 2015
ContentsJournal of the Ceramic Society of Japan · 2015
CoverJournal of the Ceramic Society of Japan · 2015
CoverJournal of the Ceramic Society of Japan · 2015
CoverJournal of the Ceramic Society of Japan · 2015