ChemInform Abstract: Taming the Silylium Ion for Low-Temperature Diels—Alder Reactions.
- 作者Hendrik F. T. Klare; Klaus Bergander; Martin Oestreich
- 卷第41卷
- 期第10期
- 印刷ISSN0931-7597
- 电子ISSN1522-2667
- 文件大小40.01KB
- 发表时间2010
- DOI10.1002/chin.201010032
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