Use of atomic layer deposition to improve the stability of silver substrates for in situ, high-temperature SERS measurements
- 作者Joshy F. John; Shannon Mahurin; Sheng Dai; Michael J. Sepaniak
- 卷第41卷
- 期第1期
- 印刷ISSN0377-0486
- 电子ISSN1097-4555
- 文件大小2736.71KB
- 发表时间2010
- DOI10.1002/jrs.2395
- 页码4-11