Investigation on critical failure thickness of hydrogenated/nonhydrogenated amorphous silicon films
Kim, Jeehwan; Inns, Daniel; Sadana, Devendra K.
- 期刊名称Journal of Applied Physics
- 作者Kim, Jeehwan; Inns, Daniel; Sadana, Devendra K.
- 卷第107卷
- 期第7期
- 印刷ISSN0021-8979
- 文件大小398.10KB
- 发表时间2010
- DOI10.1063/1.3369254