Low-temperature-processed (<100 °C) organic thin-film transistor using hollow-cathode CVD SiO
2
as the gate insulator
Fan, Ching-Lin; Chiu, Ping-Cheng; Yang, Yan-Hang; Lin, Chang-Chih
- 期刊名称Semiconductor Science and Technology
- 作者Fan, Ching-Lin; Chiu, Ping-Cheng; Yang, Yan-Hang; Lin, Chang-Chih
- 卷第25卷
- 期第7期
- 印刷ISSN0268-1242
- 电子ISSN1361-6641
- 文件大小614.23KB
- 发表时间2010-07-01
- DOI10.1088/0268-1242/25/7/075006