Decisive factors affecting plasma resistance and roughness formation in ArF photoresist
- 期刊名称Journal of Physics D: Applied Physics
- 作者Jinnai, Butsurin; Uesugi, Takuji; Koyama, Koji; Kato, Keisuke; Yasuda, Atsushi; Maeda, Shinichi; Momose, Hikaru; Samukawa, Seiji
- 卷第43卷
- 期第39期
- 印刷ISSN0022-3727
- 电子ISSN1361-6463
- 文件大小620.70KB
- 发表时间2010-10-06
- DOI10.1088/0022-3727/43/39/395204
Total synthesis of (.+-.)-isocomenePirrung, Michael C. · Journal of the American Chemical Society · 1979
Decomposition of Malonic AnhydridesPerrin, Charles L.; Flach, Agnes; Manalo, Marlon N. · Journal of the American Chemical Society · 2012
Emissive RNA AlphabetShin, Dongwon; Sinkeldam, Renatus W.; Tor, Yitzhak · Journal of the American Chemical Society · 2011
Total Synthesis of (−)-IsoschizogamineMiura, Yusuke; Hayashi, Noriyuki; Yokoshima, Satoshi; Fukuyama, Tohru · Journal of the American Chemical Society · 2012
A Concise Synthesis of (+)-ArtemisininZhu, Chunyin; Cook, Silas P. · Journal of the American Chemical Society · 2012
Janus Colloidal MatchsticksChaudhary, Kundan; Chen, Qian; Juárez, Jaime J.; Granick, Steve; Lewis, Jennifer A. · Journal of the American Chemical Society · 2012
Trifluoromethylation of α-HaloketonesNovák, Petr; Lishchynskyi, Anton; Grushin, Vladimir V. · Journal of the American Chemical Society · 2012
Spotlights on Recent <i>JACS</i> PublicationsHayashi, Shinji; Okamoto, Takayuki · Journal of the American Chemical Society · 2012