Thermal stability of SiGe films on an ultra thin Ge buffer layer on Si grown at low temperature

• 作者Chengzhao Chen; Zhiwen Zhou; Yanghua Chen; Cheng Li; Hongkai Lai; Songyan Chen
• 卷第256卷
• 期第22期
• 印刷ISSN0169-4332
• 文件大小917.46KB
• 发表时间2010
• DOI10.1016/j.apsusc.2010.04.076
• 页码6936-6940