Structural and electrical properties of radio frequency magnetron sputtered tantalum oxide films: Influence of post-deposition annealing

• 作者S.V. Jagadeesh Chandra; Chel-Jong Choi; S. Uthanna; G. Mohan Rao
• 卷第13卷
• 期第4期
• 印刷ISSN1369-8001
• 文件大小754.69KB
• 发表时间2010
• DOI10.1016/j.mssp.2010.08.002
• 页码245-251