[IEEE 2010 IEEE International Interconnect Technology Conference - IITC - Burlingame, CA, USA (2010.06.6-2010.06.9)] 2010 IEEE International Interconnect Technology Conference - Path-finding for integration of porous SiOCH films (k∼2.5) in system-LSIs

Inoue, N.; Ueki, M.; Yamamoto, H.; Kume, I.; Iguchi, M.; Kaneko, T.; Honda, H.; Oshida, D.; Ozawa, K.; Ishizuka, I.; Horikoshi, Y.; Kawahara, J.; Hayashi, Y.

作者Inoue, N.; Ueki, M.; Yamamoto, H.; Kume, I.; Iguchi, M.; Kaneko, T.; Honda, H.; Oshida, D.; Ozawa, K.; Ishizuka, I.; Horikoshi, Y.; Kawahara, J.; Hayashi, Y.
文件大小1140.43KB
发表时间2010
DOI10.1109/iitc.2010.5510746
页码1-3

发现好书期刊，享受阅读乐趣

[IEEE 2010 IEEE International Interconnect Technology Conference - IITC - Burlingame, CA, USA (2010.06.6-2010.06.9)] 2010 IEEE International Interconnect Technology Conference - Path-finding for integration of porous SiOCH films (k∼2.5) in system-LSIs