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Recharging processes, radiation induced strain and changes of OH− bands under H+ ion implantation in Ti doped lithium niobate

Recharging processes, radiation induced strain and changes of OH− bands under H+ ion implantation in Ti doped lithium niobate

P. Kumar; S. Moorthy Babu; I. Bhaumik; S. Ganesamoorthy; A.K. Karnal; Praveen Kumar; G.O. Rodrigues; I. Sulania; D. Kanjilal; A.K. Pandey; R. Raman
  • 作者P. Kumar; S. Moorthy Babu; I. Bhaumik; S. Ganesamoorthy; A.K. Karnal; Praveen Kumar; G.O. Rodrigues; I. Sulania; D. Kanjilal; A.K. Pandey; R. Raman
  • 卷第268卷
  • 期第2期
  • 印刷ISSN0168-583X
  • 文件大小960.85KB
  • 发表时间2010
  • DOI10.1016/j.nimb.2009.10.186
  • 页码172-177
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